西安工程大学学报2026，Vol.40Issue(1)：27-34,8.DOI:10.13338/j.issn.1674-649x.2026.01.004
溅射时间对TiCuN薄膜电磁屏蔽和红外发射性能的影响
Effect of sputtering duration on electromagnetic shielding and infrared emissivity properties of TiCuN films
摘要
Abstract
In order to investigate the effect of sputtering time on the microstructure and proper-ties of TiCuN films,reactive magnetron co-sputtering technique was applied to prepare TiCuN films on glass substrates,and the effects of different sputtering times(1 200,2 400,3 600,and 5 400 s)on the phase compositions,microscopic morphology,resistivity,electromagnetic shiel-ding efficacy,and infrared emissivity of TiCuN films were investigated.The results indicate that the films prepared at sputtering times of 1 200 and 2 400 s are composed of TiCuN,whereas the films are composed of TiCuN and Cu phases when the sputtering time is exceeds 3 600 s.The films prepared at 3 600 s have a higher surface densification,fewer defects,and the lowest electri-cal resistivity,while the films prepared at 5 400 s have significant particle agglomeration on the surface,numerous pores,more defects,and the highest electrical resistivity.The films are mainly absorptive,thereby avoiding secondary pollution of the environment,and the absorption efficiency of the films reaches a maximum value of 49 dB at 3 600 s.The infrared emissivity changes in the prepared films are consistent with the resistivity changes.The infrared emissivity of the films rea-ches a minimum at 3 600 s,of 0.11.关键词
TiCuN薄膜/磁控共溅射/溅射时间/电磁屏蔽/红外发射率Key words
TiCuN films/reactive magnetron co-sputtering/sputtering time/electromagnetic shielding/infrared emissivity分类
矿业与冶金引用本文复制引用
徐洁,陈润,陈鲸朴,吴奇帅,卢琳琳..溅射时间对TiCuN薄膜电磁屏蔽和红外发射性能的影响[J].西安工程大学学报,2026,40(1):27-34,8.基金项目
陕西省自然科学基础研究计划(2023-JC-YB-476,2023-JC-YB-471) （2023-JC-YB-476,2023-JC-YB-471）
陕西省航空科学基金(2024Z056111001) （2024Z056111001）
