首页|期刊导航|半导体学报(英文版)|Flexible ITO TFTs with high mobility of 39.1 cm2·V-1·s-1 and excellent uniformity fabricated via mass-production compatible process
半导体学报(英文版)2026,Vol.47Issue(3):72-80,9.DOI:10.1088/1674-4926/25060021
Flexible ITO TFTs with high mobility of 39.1 cm2·V-1·s-1 and excellent uniformity fabricated via mass-production compatible process
Flexible ITO TFTs with high mobility of 39.1 cm2·V-1·s-1 and excellent uniformity fabricated via mass-production compatible process
摘要
关键词
InSnO/thin film transistor/large-scale uniformity/flexibilityKey words
InSnO/thin film transistor/large-scale uniformity/flexibility引用本文复制引用
Zuoxu Yu,Runxiao Shi,Wangran Wu,Yuzhen Zhang,Tingrui Huang,Wenting Xu,Mingming Liu,Di Gui,Kaizhi Sui,Guangan Yang,Weifeng Sun..Flexible ITO TFTs with high mobility of 39.1 cm2·V-1·s-1 and excellent uniformity fabricated via mass-production compatible process[J].半导体学报(英文版),2026,47(3):72-80,9.基金项目
The work is supported in part by the National Natural Sci-ence Foundation of China(62274033),Natural Science Founda-tion of Jiangsu Province(BK20221453),and Fundamental Research Funds for the Central Universities. (62274033)