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融合沟道倾斜角的3D NAND存储单元建模及编程策略优化

林训涛 韩国军

广东工业大学学报2026,Vol.43Issue(2):91-100,10.
广东工业大学学报2026,Vol.43Issue(2):91-100,10.DOI:10.12052/gdutxb.250167

融合沟道倾斜角的3D NAND存储单元建模及编程策略优化

Modeling of 3D NAND Memory Cells with Taper Angle and Programming Strategy Optimization

林训涛 1韩国军1

作者信息

  • 1. 广东工业大学 信息工程学院,广东 广州 510006
  • 折叠

摘要

Abstract

With the continuous increase in the number of stacking layers in 3D NAND flash memory,the aspect ratio caused by deep hole etching processes also increases accordingly.The resulting taper angle leads to a broadening of the threshold voltage distribution of memory cells,adversely affecting device storage reliability.Current solutions to this problem primarily include process-based methods such as etching optimization and channel compensation,or strategies like error correction coding and read-retry.However,these approaches generally face challenges such as implementation complexity and high hardware overhead.To overcome these limitations and effectively mitigate the impact of the taper angle,a simulation model of a memory string incorporating taper angles is first constructed based on the Sentaurus TCAD platform,validating and analyzing the influence of deep hole taper on the threshold voltage distribution gradient.On this basis,a strategy for dynamic optimization of the pass voltage amplitude in adjacent cells is proposed.This strategy differentially optimizes the pass voltage of word lines adjacent to the target memory cell according to its vertical position in the memory string,thereby accurately compensating for the longitudinal voltage gradient induced by channel taper.Simulation results demonstrate that compared to conventional programming strategy,the proposed strategy optimizes the maximum voltage difference and the standard deviation of distribution,achieving reductions of 62.4%and 61.4%,respectively,in linear mode,and 63.7%and 64.3%in nonlinear mode,while constraining the threshold voltage disturbance of adjacent cells within 3 mV and maintaining stable programming speed.

关键词

3D NAND闪存/器件建模/沟道倾斜角/阈值电压分布/动态导通电压

Key words

3D NAND flash memory/device modeling/channel taper angle/threshold voltage distribution/dynamic pass voltage

分类

信息技术与安全科学

引用本文复制引用

林训涛,韩国军..融合沟道倾斜角的3D NAND存储单元建模及编程策略优化[J].广东工业大学学报,2026,43(2):91-100,10.

基金项目

NSFC-广东省联合基金资助项目(U2001203) (U2001203)

广东工业大学学报

1007-7162

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