无机材料学报2026，Vol.41Issue(4)：486-492,7.DOI:10.15541/jim20250344
工作气压对AlScN薄膜结构和电学性能的影响
Effects of Working Pressure on the Structure and Electrical Properties of AlScN Thin Films
摘要
Abstract
Since ferroelectric properties of Al1-xScxN thin films were experimentally confirmed in 2019,wurtzite-structured ferroelectric materials have received worldwide attention.However,the strong dependence of their ferroelectric performance on deposition parameters still remains a significant challenge,limiting their reliable integration into practical device applications.This study aims to systematically investigate the influence of sputtering working pressure on microstructural evolution and resultant ferroelectric properties of Al1-xScxN thin films.The primary goal is to identify the optimal pressure window that yields superior ferroelectric performance and to understand the underlying structure-property relationships.Al0.71Sc0.29N thin films were deposited on silicon substrates using reactive magnetron sputtering in a pure nitrogen atmosphere,and experienced the working pressure varied from 0.27 Pa to 1.33 Pa.The correlation between crystal structure,surface morphology,and ferroelectric properties of the thin film was analyzed.The results showed that the working pressure significantly affected crystallization quality of Al0.71Sc0.29N thin films,among which prepared under 0.52 Pa had the best crystallization quality and excellent ferroelectric properties.As the working pressure increased,the pyramid-like structures began to appear on surface of the film and gradually increased,while the static leakage current also gradually decreased.This work conclusively demonstrates that sputtering working pressure is one of the decisive factors in tuning microstructure and ferroelectricity of Al1-xScxN films.The correlation between working pressure-induced morphological changes and leakage current suppression offers valuable insights for engineering high-performance wurtzite ferroelectric devices.关键词
AlScN薄膜/工作气压/微观结构/铁电性能Key words
AlScN film/working pressure/micro structure/ferroelectric property分类
化学化工引用本文复制引用
隋金洋,周大雨,赵文瑾,童祎,王新朋..工作气压对AlScN薄膜结构和电学性能的影响[J].无机材料学报,2026,41(4):486-492,7.基金项目
国家自然科学基金(52472120) （52472120）
中央高校基本科研业务费资助项目(DUT24LAB117) （DUT24LAB117）
苏州实验室科研项目(SK-1202-2024-012) National Natural Science Foundation of China(52472120) （SK-1202-2024-012）
Fundamental Research Funds for the Central Universities of China(DUT24LAB117) （DUT24LAB117）
Suzhou Laboratory Project(SK-1202-2024-012) （SK-1202-2024-012）
