光学精密工程2026，Vol.34Issue(7)：1087-1096,10.DOI:10.37188/OPE.20263407.1087
基于双离子束溅射沉积工艺优化的极紫外多层反射薄膜界面质量提升
Improving of interfacial quality of extreme ultraviolet multilayer reflective film based on process optimization of dual ion beam sputtering deposition
摘要
Abstract
In the fabrication of Mo-Si multilayers,achieving smooth and sharp interfaces is critical for real-izing high reflectivity in extreme ultraviolet(EUV)light,as atomic intermixing between adjacent Mo and Si layers along with microscopic interfacial fluctuations can significantly degrade EUV reflectivity.To ad-dress this challenge,we propose a process portfolio that combines angular deposition with flood ion beam etching to enhance interface quality.By utilizing stage modifications in dual ion beam sputtering,the inci-dent angle of the sputtered atom flux during deposition and the parameters of the auxiliary ion beam for pol-ishing can be precisely controlled to suppress intermixing and interfacial fluctuations.Experimental results show that the thickness of the intermixing layer is reduced to 0.6 nm,and interfacial roughness is sup-pressed to 0.2 nm using this approach.This method fundamentally improves the interfacial quality of Mo-Si multilayers and offers a practical solution for the fabrication of high-reflectance EUV optics.关键词
Mo-Si多层反射膜/EUV光刻/双离子束溅射沉积/斜角沉积/掠角刻蚀Key words
Mo-Si multilayer reflective film/EUV lithography/dual ion beam sputtering deposition/oblique angle deposition/glancing angle etching分类
数理科学引用本文复制引用
陈艺勤,冀鸣,邵秋,刘伟基,李弋舟,段辉高..基于双离子束溅射沉积工艺优化的极紫外多层反射薄膜界面质量提升[J].光学精密工程,2026,34(7):1087-1096,10.基金项目
国家重点研发计划资助项目(No.2024YFB3408803) （No.2024YFB3408803）
国家自然科学基金资助项目(No.52475449) （No.52475449）
湖南省自然科学基金资助项目(No.2024JJ5073) （No.2024JJ5073）
松山湖材料实验室开放课题基金资助项目(No.2023SLABFN01) （No.2023SLABFN01）
