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高Mg浓度Zn1-xMgxO薄膜的铁电性能研究

朱龙潇 周大雨 赵文瑾 隋金洋 童祎 王新朋

测试技术学报2026,Vol.40Issue(3):282-288,7.
测试技术学报2026,Vol.40Issue(3):282-288,7.DOI:10.62756/csjs.1671-7449.2026018

高Mg浓度Zn1-xMgxO薄膜的铁电性能研究

Ferroelectric Properties of Zn1-xMgxO Thin Films with High Magnesium Content

朱龙潇 1周大雨 1赵文瑾 1隋金洋 1童祎 2王新朋2

作者信息

  • 1. 大连理工大学 材料科学与工程学院,辽宁 大连 116024
  • 2. 苏州实验室,江苏 苏州 215123
  • 折叠

摘要

Abstract

As an emerging wurtzite ferroelectric,Zn ₁-ₓMgₓO has become a focal point in ferroelectric research.However,its narrow composition window has limited practical applications in non-volatile memory devices.Using reactive magnetron sputtering,Zn₁-ₓMgₓO thin films were grown on(100)-Si sub-strates at room temperature,extending the ferroelectric composition range to 0.37≤x≤0.54.X-ray dif-fraction(XRD)results indicate that all films exhibit good crystallinity with a c-axis preferred orientation.Notably,the coexistence of rock-salt and wurtzite phases was observed in films with x>0.48.Scanning electron microscopy(SEM)reveals that a gradual morphological transition of grain clusters from dome-like to quadrilateral configurations is induced by the increased Mg content.Electrical characterization dem-onstrates composition-dependent ferroelectric properties:remanent polarization(Pr)decreases from 74 μC·cm-2 to 35 μC·cm-2,while coercive field(Ec)remains below 3 MV·cm⁻¹.The reduction in Pr likely originates from the increased fraction of non-polar phases,whereas the rise in Ec may be associated with the combined effects of interfacial stress and Mg doping.

关键词

Zn1-xMgxO薄膜/纤锌矿铁电材料/高Mg含量/相分离

Key words

Zn1-xMgxO thin films/wurtzite ferroelectric materials/high-Mg-content/phase separation

分类

通用工业技术

引用本文复制引用

朱龙潇,周大雨,赵文瑾,隋金洋,童祎,王新朋..高Mg浓度Zn1-xMgxO薄膜的铁电性能研究[J].测试技术学报,2026,40(3):282-288,7.

基金项目

国家自然科学基金资助项目(52472120) (52472120)

中央高校基本科研业务资助项目(DUT24LAB117) (DUT24LAB117)

苏州实验室科研项目(SK-1202-2024-012) (SK-1202-2024-012)

测试技术学报

1671-7449

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