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入射角偏差对消光椭偏法膜厚测量影响的研究

杜陈伙 张树 胡佳成 皮磊 施玉书

计量学报2026,Vol.47Issue(4):475-481,7.
计量学报2026,Vol.47Issue(4):475-481,7.DOI:10.3969/j.issn.1000-1158.2026.04.01

入射角偏差对消光椭偏法膜厚测量影响的研究

Effects of Incident Angle Deviation on Film Thickness Measurement Using Extinction Ellipsometry

杜陈伙 1张树 2胡佳成 3皮磊 4施玉书2

作者信息

  • 1. 中国计量大学,浙江 杭州 310018||中国计量科学研究院,北京 100029
  • 2. 中国计量科学研究院,北京 100029||深圳中国计量科学研究院 技术创新研究院,广东 深圳 518107
  • 3. 中国计量大学,浙江 杭州 310018
  • 4. 中国计量科学研究院,北京 100029
  • 折叠

摘要

Abstract

In the measurement of film thickness by extinction ellipsometry,the angle of incidence,as an important process parameter that changes the polarization states of incident and reflected light waves,significantly affects the accuracy of film thickness measurements.A He-Ne laser with a wavelength of 632.8 nm is used to establish a mathematical model between incident angle deviation and measured film thickness deviation under different incident angles.The model is verified by constructing an extinction ellipsometry setup and testing a silica-on-silicon sample.For the measured sample with a film thickness of 102.55 nm,theoretical calculations show that every 0.01° variation in the incident angle introduces a maximum error of 0.008 7 nm to the measured film thickness.Measurement results demonstrate that the actual error caused by incident angle deviation is consistent with model expectations,which further validates the reliability of the extinction ellipsometry setup.The analysis method for the uncertainty component introduced by incident angle deviation in extinction ellipsometry is optimized.The uncertainty component introduced by the incident angle of the setup is 0.004 nm.

关键词

纳米计量/薄膜厚度/消光椭偏法/误差分析/入射角偏差

Key words

nanometrology/extinction ellipsometry/film thickness/error analysis/incident angle deviation

分类

通用工业技术

引用本文复制引用

杜陈伙,张树,胡佳成,皮磊,施玉书..入射角偏差对消光椭偏法膜厚测量影响的研究[J].计量学报,2026,47(4):475-481,7.

基金项目

国家重点研发计划(2022YFF0605501) (2022YFF0605501)

计量学报

1000-1158

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