微型电脑应用2026，Vol.42Issue(4)：38-41,46,5.
基于改进RCF算法的光刻机Mark点检测精度提升方法研究
Research on a Method for Improving Mark Point Detection Accuracy of Lithography Machine Based on Improved RCF Algorithm
摘要
Abstract
The lithography machine plays a crucial role in semiconductor manufacturing,but its performance is susceptible to various factors,resulting in a decline in the accuracy and efficiency of tracking control.To improve the accuracy and stability of the Mark point detection in the lithography machine and enhance the overall lithography quality and production efficiency,an improved richer convolutional features for edge detection RCF algorithm integrating the feature integration model is proposed.The proposed algorithm optimizes the network structure and redesigns the loss function,introducing modulation factors to en-hance the algorithm's ability to handle complex samples.Experimental results show that after 600 training iterations,the Mark point detection accuracy of the proposed algoritm reaches 90％.When processing signal features,the maximum gap between the true value and the predicted value of positioning accuracy reached 3.5 nm,demonstrating high accuracy and stability.The material integrity of the lithography machine using the proposed algorithm reaches 97％,effectively improving the lithography quality and production efficiency.关键词
光刻机Mark点/改进RCF/自适应算法/检测精度Key words
Mark point of lithography machine/improved RCF/adaptive algorithm/detection accuracy分类
信息技术与安全科学引用本文复制引用
李天吴..基于改进RCF算法的光刻机Mark点检测精度提升方法研究[J].微型电脑应用,2026,42(4):38-41,46,5.基金项目
2022年度北京市科技新星计划资助(20220484196) （20220484196）
