太赫兹科学与电子信息学报2026，Vol.24Issue(5)：635-640,6.DOI:10.11805/TKYDA2025182
介质材料表面镀膜工艺在金刚石窗上的应用
Application of dielectric material surface coating process on diamond window
摘要
Abstract
In this study,the plasma sputtering deposition characteristics of titanium,molybdenum and nickel are investigated by using single crystal silicon wafer as the simulation substrate.It is found that the deposition rates of Ti/Mo/Ni are 7～14,9～21,8～16 nm/min,respectively.Scanning Electron Microscope(SEM)shows that the surface particle sizes are 10～20,50～200,15～30 nm,respectively.The Mo layer shows ordered grain alignment,and the Ni layer is agglomerated.The deposition efficiency is determined by the smooth surface orientation of the substrate.The deposition rate is 9,10 and 7 nm/min when the substrate is oriented upward,and 15,18 and 14 nm/min when the substrate is oriented downward.Optimizing the target-sample spacing can increase the sputtering rate,but the target maintenance needs to be optimized simultaneously.Based on the experimental results of silicon wafer,the efficient deposition of Ti-Mo-Ni composite coating on diamond substrate is successfully realized,and the metallization and vacuum sealing of diamond window are completed,which provides technical support for engineering application.关键词
溅射/镀膜/溅射速率/金刚石窗片Key words
sputtering/coating/sputtering rate/diamond window分类
信息技术与安全科学引用本文复制引用
武子昂,刘本田,陈波,刘吉祥,刘振英..介质材料表面镀膜工艺在金刚石窗上的应用[J].太赫兹科学与电子信息学报,2026,24(5):635-640,6.基金项目
国家重点研发计划资助项目(2021YFA1600303) （2021YFA1600303）
太赫兹波高频辐射器组件的焊接技术服务合同(25KHH115) （25KHH115）
