中国光学（中英文）2026，Vol.19Issue(3)：534-543,10.DOI:10.37188/CO.2025-0146
多层介质膜激光诱导损伤改进模型与实验研究
Improved model and experimental study on laser-induced damage in multilayer dielectric films
摘要
Abstract
The structure of multilayer dielectric film will modulate the optical field,thus in the study of laser-induced damage characteristics,it is necessary to consider the energy distribution within the film system and the resulting changes in material optical properties.Taking the HfO2/SiO2 multilayer dielectric film structure as an example,and based on the laser-induced ionization/electron multiplication process,the Drude model is introduced into the optical field calculation,extending the film layer refractive index from a static constant to a dynamic complex refractive index driven by the free electron density.Based on this,a thermal conduction(and thermal stress)model is coupled to calculate the evolution of thermal effects inside the thin film under nanosecond pulsed laser irradiation,and the corresponding damage threshold is determined to be 13.65 J/cm2,and the damage characteristics of the film are studied experimentally.The verification experiment observed that the damage appearance of the HfO2/SiO2 multilayer dielectric film is a round hole type,which is a typic-al thermal melting damage,and is consistent with the conclusion of the theoretical model.The measured damage threshold is 13.75 J/cm2,which is only higher than the theoretical analysis result.The improved mod-el established is helpful to further analyse the interaction between strong laser and multilayer dielectric film from the theoretical level,and to better study the damage resistance of optical thin film.关键词
HfO2/SiO2多层介质膜/场致效应/Drude模型/热力耦合/损伤阈值Key words
HfO2/SiO2 multilayer dielectric films/field effect/Drude model/thermal-stress coupling/dam-age threshold分类
信息技术与安全科学引用本文复制引用
王震,涂帅,张蓉竹..多层介质膜激光诱导损伤改进模型与实验研究[J].中国光学（中英文）,2026,19(3):534-543,10.基金项目
国家自然科学基金(No.62205316)Supported by National Natural Science Foundation of China(No.62205316) （No.62205316）
