云南化工2026，Vol.53Issue(6)：1-5,5.DOI:10.3969/j.issn.1004-275X.2026.06.01
西门子法多晶硅化学气相沉积过程提质降耗研究进展
Advances in Quality Improvement and Energy Consumption Reduction for the Chemical Vapor Deposition of Polysilicon via the Siemens Method
摘要
Abstract
Polysilicon serves as a critical foundational material for both photovoltaic and semiconductor industries.The development of high-quality,cost-effective,energy-efficient,and sustainable green production technologies for polysilicon holds significant importance.Focusing on the chemical vapor deposition(CVD)process of polysilicon via the Siemens method,this paper systematically reviews the research progress and technological breakthroughs in improving the quality and reducing the consumption of polysilicon from three aspects,including the enhancement of flow and heat transfer,optimization of electric heating mechanisms,and regulation of polysilicon deposition uniformity in polysilicon reduction furnaces.关键词
多晶硅/西门子法/还原炉/提质降耗Key words
Polysilicon/Siemens Method/Reduction Furnace/Quality Improvement and Energy Consumption Reduction分类
化学化工引用本文复制引用
李志鸿,戴恩睿,杨妮,谢刚,聂陟枫..西门子法多晶硅化学气相沉积过程提质降耗研究进展[J].云南化工,2026,53(6):1-5,5.基金项目
国家自然科学基金(52464048) （52464048）
云南省基础研究项目(202401AS070021 （）
202301BA070001-008) （）
云南省兴滇英才青年人才项目(YNWR-QNBJ-2020-017) （YNWR-QNBJ-2020-017）
云南省教育厅科学研究基金项目(2025Y1063). （2025Y1063）
