计量学报2026，Vol.47Issue(7)：949-956,8.DOI:10.3969/j.issn.1000-1158.2026.07.01
晶圆表面球形污染物散射特性的角度依赖性研究
Angle-dependent Study of Light Scattering Properties of Wafer Surface Residues
摘要
Abstract
To investigate the influence of incident and scattering angles on spherical contaminant detection on wafer surfaces,a study based on light scattering principles was conducted.The scattering field was calculated using Bobbert and Vlieger theory with Bidirectional reflectance distribution function(BRDF).A detection system with adjustable angles was constructed to examine scattering intensity's angular dependence using 500 nm Polystyrene latex particles(PSL).Experimental angles were limited to prevent reflection interference and detector damage.With collection angle at 20 °,the signal-to-noise ratio increased by 68.89%as incident angle decreased from 80 ° to 40 °.With incident angle at 70 °,the signal-to-noise ratio increased by 102.25%as collection angle increased from 0 ° to 50 °.The scattered field concentrated near the specular reflection angle,exhibiting higher detection sensitivity in this region.Root-mean-square errors between simulation and measurement were 0.073 1(fixed scattering angle)and 0.094 2(fixed incident angle),validating the model's accuracy.关键词
散射测量/无图案晶圆/球形污染物/入射角度/晶圆表面污染检测Key words
scattering measurement/unpatterned wafer/spherical contaminants/angle of incidence/wafer surface contamination detection分类
通用工业技术引用本文复制引用
孙印壮,施玉书,张树,王芳,胡佳成..晶圆表面球形污染物散射特性的角度依赖性研究[J].计量学报,2026,47(7):949-956,8.基金项目
国家重点研发计划(2022YFF0605501) （2022YFF0605501）
