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纳米光栅间距测量系统的主要误差分析与仿真

梁利杰 苏祎 刘丽琴 谢张宁 雷李华 管钰晴 徐瑞书 张玉杰 朱言瑧 郭创为 邹文哲

计量学报2026,Vol.47Issue(7):994-1002,9.
计量学报2026,Vol.47Issue(7):994-1002,9.DOI:10.3969/j.issn.1000-1158.2026.07.07

纳米光栅间距测量系统的主要误差分析与仿真

Analysis and Simulation of Main Errors in Nano-grating Pitch Measurement System

梁利杰 1苏祎 1刘丽琴 1谢张宁 1雷李华 1管钰晴 1徐瑞书 1张玉杰 1朱言瑧 1郭创为 1邹文哲1

作者信息

  • 1. 上海市计量测试技术研究院有限公司,上海 201203||上海在线检测与控制技术重点实验室,上海 201203
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摘要

Abstract

A theoretical analysis and simulation study on the main error sources of a grating pitch measurement system are conducted based on a direct-tracing grating interferometer.The focus is placed on the influences of pitch error,yaw error,and roll error of the grating under test on the measurement results of grating pitch.Through theoretical analysis,experimental measurement,and uncertainty evaluation,the main error sources of the system are identified.A system model is established using optical simulation software to simulate the displacement of the grating along the vector direction,extract the coherent phase at the detector,and perform phase unwrapping and grating pitch calculation.By varying the rotation angles of the grating under test around the X-,Y-,and Z-axes,the effects on measurement accuracy are systematically analyzed.Simulation results show that when the grating under test has a pitch angle of 0.01°~0.10°,the relative error of the measured grating pitch is 0.12%;when a roll angle of 0.01°~0.10° exists,the relative error reaches 0.41%;and when a yaw angle of 0.01°~0.10° is present,the range of the measured grating pitch is up to 6.9 nm.

关键词

纳米光栅/光栅间距/光栅干涉仪/仿真/俯仰误差/偏摆误差/旋转误差

Key words

nano-grating/grating pitch/grating interferometer/simulation/pitch error/yaw error/roll error

分类

通用工业技术

引用本文复制引用

梁利杰,苏祎,刘丽琴,谢张宁,雷李华,管钰晴,徐瑞书,张玉杰,朱言瑧,郭创为,邹文哲..纳米光栅间距测量系统的主要误差分析与仿真[J].计量学报,2026,47(7):994-1002,9.

基金项目

国家重点研发计划(2024YFF0619903) (2024YFF0619903)

国家自然科学基金(52475563) (52475563)

上海市科学技术委员会项目(24ZR1492200) (24ZR1492200)

上海市基础研究计划"集成电路"项目(25JD1403500) (25JD1403500)

计量学报

1000-1158

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