化学工程2026，Vol.54Issue(8)：30-36,7.DOI:10.3969/j.issn.1005-9954.2026.08.006
基于COMSOL的高纯氢氟酸中痕量As3+氧化脱除模拟
COMSOL-based simulation of oxidative removal of trace amounts of As3+from hydrofluoric acid
摘要
Abstract
An efficient and environmentally friendly purification process for high-purity HF(hydrofluoric)acid,a critical raw material in the semiconductor and electronics industries,is developed.Existing methods for removing As3+impurities face challenges such as secondary contamination,discontinuous operation,and high costs.To address these limitations,a F2/N2 mixed gas was employed as an oxidizing agent to convert trace As3+into volatile AsF5,and separation was achieved based on the differences in volatility between AsF5 and hydrofluoric acid.A numerical model of the oxidation tower was developed in COMSOL to evaluate the effects of tower geometry and operational parameters on As3+removal efficiency.The results demonstrate that optimal performance is achieved under the following conditions:an inlet As3+mass fraction of 5 × 10-6,F2/N2 molar ratio of 0.2,gas flow rate of 60 L/h,and the use of staggered semi-circular baffles.Under these optimized parameters,the outlet As3+concentration is reduced to 4.303 4 × 10-11 mol/m3.This work provides a theoretical foundation for implementing continuous arsenic removal in high-purity HF production.关键词
高纯氢氟酸/数值模拟/痕量As3+除杂/结构优化/最优工况Key words
high-purity hydrofluoric acid/numerical simulation/trace As3+decontamination/structural optimization/optimal operating conditions分类
化学化工引用本文复制引用
戴雪凡,郭其景,杨华春,刘海霞,薛峰峰,易浩,宋少先..基于COMSOL的高纯氢氟酸中痕量As3+氧化脱除模拟[J].化学工程,2026,54(8):30-36,7.基金项目
国家重点研发计划项目(2022YFC2904805) （2022YFC2904805）
