首页|期刊导航|Journal of Materiomics|Low read/write voltage and high endurance of the ferroelectric memory with Hf_(0.5)Zr_(0.5)O_(2) film
Journal of Materiomics2026,Vol.12Issue(3):P.25-32,8.DOI:10.1016/j.jmat.2026.101175
Low read/write voltage and high endurance of the ferroelectric memory with Hf_(0.5)Zr_(0.5)O_(2) film
摘要
关键词
Ferroelectric memory/Hf_(0.5)Zr_(0.5)O_(2)film/Low read/write voltage/High endurance分类
信息技术与安全科学引用本文复制引用
Hongdi Wu,Guodong Zhang,Junfeng Zheng,Xubing Lu,Jun-Ming Liu,Guoliang Yuan..Low read/write voltage and high endurance of the ferroelectric memory with Hf_(0.5)Zr_(0.5)O_(2) film[J].Journal of Materiomics,2026,12(3):P.25-32,8.基金项目
supported by National Key Research and Development Program of China(2024YFA1208602) (2024YFA1208602)
the National Natural Science Foundation of China(62374090,52250281,62174059,92163210 and 11974167) (62374090,52250281,62174059,92163210 and 11974167)
The experiments conducted on the read/write time of the memory cells were supported by Professor Anquan Jiang and Dr.Wendi Zhang at Fudan University. ()