极端制造（英文）2026，Vol.8Issue(4)：21-24,4.DOI:10.1088/2631-7990/ae614a
Metalens-based 3D nanolithography breaks the throughput barrier
Metalens-based 3D nanolithography breaks the throughput barrier
Xuhao Fan 1Shih-Chi Chen 2Wei Xiong3
作者信息
- 1. Wuhan National Laboratory for Optoelectronics and School of Optical and Electronic Information,Huazhong University of Science and Technology,Wuhan 430074,People's Republic of China||Department of Mechanical and Automation Engineering,The Chinese University of Hong Kong,Shatin,N.T.,Hong Kong Special Administrative Region of China,People's Republic of China||Centre for Perceptual and Interactive Intelligence(CPII),Hong Kong Science Park,Shatin,N.T.,Hong Kong Special Administrative Region of China,People's Republic of China
- 2. Department of Mechanical and Automation Engineering,The Chinese University of Hong Kong,Shatin,N.T.,Hong Kong Special Administrative Region of China,People's Republic of China
- 3. Wuhan National Laboratory for Optoelectronics and School of Optical and Electronic Information,Huazhong University of Science and Technology,Wuhan 430074,People's Republic of China||Optics Valley Laboratory,Wuhan 430074,People's Republic of China
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Xuhao Fan,Shih-Chi Chen,Wei Xiong..Metalens-based 3D nanolithography breaks the throughput barrier[J].极端制造（英文）,2026,8(4):21-24,4.基金项目
This work is partially supported by the National Key Research and Development Program of China(2025YFF0514300),Research Grant Council,Senior Research Fellow Scheme(SRFS2526-4S01),and General Research Fund(14211224). （2025YFF0514300）
