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分散定向碳纳米管阵列的制备及场发射性能

蔡方凯

电子元件与材料2009,Vol.28Issue(8):8-10,3.
电子元件与材料2009,Vol.28Issue(8):8-10,3.DOI:10.3969/j.issn.1001-2028.2009.08.002

分散定向碳纳米管阵列的制备及场发射性能

Preparation and field emission properties of aligned carbon nanotube arrays with low density

蔡方凯1

作者信息

  • 1. 成都电子机械高等专科学校,通信工程系,四川,成都,610031
  • 折叠

摘要

Abstract

Using pulse electrochemical deposition methods, the low density nano-particles with diameter about 150 nm of Ni were deposited on silicon wafer coated by Cr in NiSO4 plating solution. Aligned carbon nanotubes were synthesized by plasma enhancement chemical vapor deposition from the gas containing acetylene and ammonia. Pre-etching affection of plasma was also studied. Field emission property was measured for the low density carbon nanotubes arrays, the turn-on electric field strength is about 2.39 V/(m, which shows that the aligned carbon nanotubes with low density can be decreased the screen effect, and enhances the field emission property.

关键词

碳纳米管/脉冲电化学沉积/场发射/低密度

Key words

carbon nanotubes/pulse electrochemical deposition/field emission/low density

分类

信息技术与安全科学

引用本文复制引用

蔡方凯..分散定向碳纳米管阵列的制备及场发射性能[J].电子元件与材料,2009,28(8):8-10,3.

基金项目

国家自然科学基金资助项目(No.60071053) (No.60071053)

教育部博士点基金和预研基金资助项目(No. 200806140007) (No. 200806140007)

电子元件与材料

OA北大核心CSCDCSTPCD

1001-2028

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