电子元件与材料2009，Vol.28Issue(11)：60-63,4.DOI:10.3969/j.issn.1001-2028.2009.11.017
W/Al双层膜系的纳米压痕实验及有限元仿真
Nano-indentation experiment of W/Al bilayer-film system and its finite element simulation
摘要
Abstract
W/Al bilayer-metal films were deposited on CAT.NO.7101 glass substrates using the magnetron sputtering method. Nano-indentation test was performed on the observed film samples. The loading and unloading processes of nano-indentation tests were simulated via the non-linear finite element method, and the stress distribution in the film-substrate system was analyzed. The results show that W/Al films fabricated by the magnetron sputtering method exhibit uniform structure and good mechanical properties. The elastic modulus and the mean value of hardness of W film in the W/Al bilayer-metal films are 75.433 5 GPa and 6.206 GPa respectively, which are quite different from the corresponding parameters of bulk W. The simulation curves well agree with the experimental results and clearly reflect the mechanical states as well as stress distribution of the film-substrate system.关键词
磁控溅射/纳米压痕/力学性能/有限元仿真/应力分布Key words
magnetron sputtering/ nano-indentation/ mechanical properties/ finite element simulation/ stress distribution分类
信息技术与安全科学引用本文复制引用
尚帅华,杨平,李春..W/Al双层膜系的纳米压痕实验及有限元仿真[J].电子元件与材料,2009,28(11):60-63,4.基金项目
江苏省自然科学基金资助项目(No. BK2008227) （No. BK2008227）
广西自然科学基金资助项目(No. 0339037) （No. 0339037）
