电子元件与材料Issue(7)：38-41,4.DOI:10.14106/j.cnki.1001-2028.2015.07.010
退火温度对p型CuCrO 2薄膜结构与光学性能的影响
Effect of annealing temperature on structure and transmittance properties of p-type CuCrO2 film
摘要
Abstract
CuCrO2 films were prepared by the radio frequency magnetron sputtering method on the quartz glass substrate. The effects of annealing temperature on the structure and optical properties of CuCrO2films were investigated. The results show that the as-deposited CuCrO2 film is amorphous, in which particle is small,and its transparence in visible light is only 56%. Annealing treatment can improve the structure and optical properties of CuCrO2 films. With the annealing temperature increasing, the crystallization degree of CuCrO2 films increases, and the density of pore defects decreases, respectively. The films become smooth and compact gadually, and the light transmittance of the films increases with the increasing annealing temperature, the absorption edge of the films moves toward the short wavelength. When the annealing temperature is 800℃, the film has the best transmittance property, its transparence in visible light is 70%,and the optical band gab is about 3.06 eV.关键词
CuCrO2/射频磁控溅射/退火温度/结构/光学性能/光学带隙宽度Key words
CuCrO2/radio frequency magnetron sputtering/annealing temperature/structure/optical properties/optical band gap分类
通用工业技术引用本文复制引用
黄斯楷,杨元政,谢致微..退火温度对p型CuCrO 2薄膜结构与光学性能的影响[J].电子元件与材料,2015,(7):38-41,4.基金项目
高等学校博士学科点专项科研基金资助（No.20124420110007）；广东省联合培养研究生示范基地人才培养项目资助 （）
