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硅片在背面减薄工序中降低破片率的研究

池慧雄

电子与封装Issue(7):32-34,42,4.
电子与封装Issue(7):32-34,42,4.

硅片在背面减薄工序中降低破片率的研究

Study of the Scrap Rate Decreace During Silicon Wafer Grinding

池慧雄1

作者信息

  • 1. 上海交通大学,上海200240
  • 折叠

摘要

Abstract

With the development of semiconductor industry, chip thickness requirements thiner and thinner. Chip is been thin by wafer grinding in semiconductor manufacturing. However, due to the silicon wafer thinning, the wafer scrap rate also increased during production. It comes high cost with scrap because chip has almost finished. This thesis studies the root cause of silicon wafer scrap during wafer grinding and production circulation. By improving some parts of the equipment and changing some methods in production circulation in, data shows that the scrap rate decreace maybe come true during silicon wafer grinding.

关键词

硅片/背面减薄/破片率

Key words

silicon wafer/back grinding/the scrap rate

分类

信息技术与安全科学

引用本文复制引用

池慧雄..硅片在背面减薄工序中降低破片率的研究[J].电子与封装,2013,(7):32-34,42,4.

电子与封装

1681-1070

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