电子元件与材料2016，Vol.35Issue(7)：42-45,4.DOI:10.14106/j.cnki.1001-2028.2016.07.010
衬底温度对CuAlO2薄膜的结构与光学性能的影响
Effect of substrate temperature on structure and optical properties of CuAlO2 thin film
摘要
Abstract
CuAlO2 films on the quartz glass substrate with different temperatures were prepared by the radio frequency magnetron sputtering method. Surface morphology, microstructure and optical performance of the annealed films were investigated. The results show that when the temperature rises, grain crystals form and grow up. The films surface is characterized by smooth and densification gradually. The light transmittance of the films increases with the increasing of substrate temperature. It is found that when the substrate temperature is 400 ℃, the optimum performance of the films can be obtained. There are the highest (101) peak of XRD and uniform crystal grain. The visible light transmittance is 76.6%. The optical band gab is about 3.69 eV.关键词
CuAlO2薄膜/磁控溅射/衬底温度/透光性/禁带宽度/表面形貌Key words
CuAlO2 thin film/magnetron sputtering/substrate temperature/light transmittance/band gap/surface morphology分类
信息技术与安全科学引用本文复制引用
徐继承,谢致薇,杨元政..衬底温度对CuAlO2薄膜的结构与光学性能的影响[J].电子元件与材料,2016,35(7):42-45,4.基金项目
国家自然科学基金资助项目 （）
