电子元件与材料2017，Vol.36Issue(1)：33-37,5.DOI:10.14106/j.cnki.1001-2028.2017.01.006
一种新型石墨烯/多孔氮化硅复合材料的制备及性能研究
Fabrication and properties of a novel graphene/porous silicon nitride composite material
摘要
Abstract
Byplasma enhanced chemical vapor deposition method,dry etching(IBM),chemical vapor phase deposition and substrate corrosion method,anovel graphene and porous silicon nitride composite material wasprepared. Thenew silicon nitride substrate of the structures hasdifferent morphologies(hole array and channel array). The characterization and surface stress of graphene/porous silicon nitride composites were investigated by scanning electron microscopy(SEM), atomic force microscopy (AFM)and Raman spectroscopy.The results show that the surface stress of graphene on the silicon nitride with different morphologiesand structuresisdifferent. Surface roughness, surface morphology and surface area are the main factorswhich canaffect the surface stress of composite structures. Compared to the silicon nitride channel morphology (strain in the range of0.16%-0.27%),the silicon nitride porous morphology (strain in the range of 0.1%-0.12%) is more conducive to ease the graphene/porous silicon nitride composite surface stress concentration problem.关键词
石墨烯/多孔氮化硅/表面应力/微结构/性能调控/微纳器件Key words
graphene/porous silicon nitride/surface stress/microstructure/property modulation/micro nano device分类
通用工业技术引用本文复制引用
钱栋梁,葛道晗,程广贵,张立强..一种新型石墨烯/多孔氮化硅复合材料的制备及性能研究[J].电子元件与材料,2017,36(1):33-37,5.基金项目
国家自然科学基金资助（No.11404146）；江苏省自然基金青年基金资助（No. BK20140556）；江苏大学高级人才启动基金（No.13JDG020, No.13JDG021）；江苏省博士后基金 （）
