电子元件与材料2017，Vol.36Issue(1)：57-61,5.DOI:10.14106/j.cnki.1001-2028.2017.01.011
直流溅射法制备SnO2纳米颗粒的机理及工艺研究
Process and mechanism of SnO2nanoparticles prepared by DC sputtering
摘要
Abstract
SnO2nanoparticles were prepared by using DC sputtering. The formationmechanism of SnO2nanoparticles was analyzed and the effects of substrate materials and sputtering time on SnO2nanoparticles were investigated. The results show that the sputtering time hasa significant effect on the size of SnO2nanoparticles. The particle size increaseslinearly with the sputtering time, grown fromabout20 nm(1 min)toabout80 nm(10 min). Substrate materials mainly affect the morphology and distribution of SnO2nanoparticles.Compared with monocrystalline silicon, microslide and Au-sprayed microslidethree kinds of substrate materials,itis foundthat nanoparticles havea uniform distribution on monocrystalline silicon, but a nonuniform distribution on microslide.With theincreasing ofsputtering time, nanoparticles on microslide would cluster andbecomecoarse. In the case of Au-sprayed microslide, the morphology and distribution of nanoparticles can beobviously improved.关键词
SnO2/纳米颗粒/直流溅射/制备工艺/机理研究/衬底Key words
SnO2/nanoparticles/DC sputtering/preparation process/mechanism research/substrate分类
信息技术与安全科学引用本文复制引用
刘敬茹,宋西平,王涵,陈嘉君,张蓓..直流溅射法制备SnO2纳米颗粒的机理及工艺研究[J].电子元件与材料,2017,36(1):57-61,5.基金项目
国家自然科学基金资助(No.21171018)；国家自然科学基金资助(No.51271021)；北京市自然科学基金资助 （No.21171018）
