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大尺寸AlN活性金属焊接覆铜基板的界面结合机理

许海仙 曾祥勇 朱家旭 周泽安 张振文 汤文明

电子元件与材料2024,Vol.43Issue(5):573-577,584,6.
电子元件与材料2024,Vol.43Issue(5):573-577,584,6.DOI:10.14106/j.cnki.1001-2028.2024.1545

大尺寸AlN活性金属焊接覆铜基板的界面结合机理

Interface bonding mechanism of large size AlN active metal brazing substrate

许海仙 1曾祥勇 2朱家旭 3周泽安 3张振文 1汤文明4

作者信息

  • 1. 中国电子科技集团公司第43研究所,安徽合肥 230088||合肥圣达电子科技实业有限公司,安徽合肥 230088
  • 2. 中国电子科技集团公司第43研究所,安徽合肥 230088
  • 3. 合肥圣达电子科技实业有限公司,安徽合肥 230088
  • 4. 合肥工业大学材料科学与工程学院,安徽合肥 230009||微系统安徽省重点实验室,安徽合肥 230088
  • 折叠

摘要

Abstract

Based on the 190 mmx139 mmx0.635 mm large-size AlN active metal brazing(AMB)substrate technological process,the microstructures and phase compositions of the brazed interface were investigated to clarify the interface bonding mechanism,which provide a guide for preparing large size,low porosity,and high peeling strength AlN-AMB substrate.The results show that during brazing large-size AlN-AMB substrate,Ag-Cu alloy in the Ag-Cu-Ti alloy solder is bonded to the Cu foil to form an intensive metallurgical bonding interface via atomic interdiffusion.Meanwhile,the active Ti atoms in the solder diffuse to the AlN substrate surface,and react with AlN to form a 0.5-1 μm TiN reaction layer to finally construct a strong bonding reaction interface.Moreover,the solder melt do not fill the AlN grain boundaries and pits on the surface of the AlN substrate,and the Ti atoms do not react with the Y-Al-O secondary phase particles.It results in the formation of the discontinuous TiN reaction layer and pores.As a result,the interface bonding strength and reliability are decreased for the large size AlN-AMB substrate.

关键词

氮化铝基板/活性金属钎焊/显微结构/相组成/Ag-Cu-Ti钎料

Key words

AlN substrate/active metal brazing/microstructure/phase/Ag-Cu-Ti solder

分类

化学化工

引用本文复制引用

许海仙,曾祥勇,朱家旭,周泽安,张振文,汤文明..大尺寸AlN活性金属焊接覆铜基板的界面结合机理[J].电子元件与材料,2024,43(5):573-577,584,6.

基金项目

安徽省重大科技专项(202003a05020006) (202003a05020006)

安徽省重点研究与开发计划项目(202004a05020022) (202004a05020022)

电子元件与材料

OA北大核心CSTPCD

1001-2028

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