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新型多级沟槽结势垒肖特基二极管OA北大核心CSTPCD

New type multi-step trench junction barrier Schottky diode

中文摘要英文摘要

提出了一种新型多级沟槽结势垒肖特基(MTJBS)二极管结构,并利用Silvaco TCAD软件对其进行仿真优化.结果表明:在相同的结构参数下,当反向偏压等于1 200 V时,JBS二极管的肖特基接触处的峰值电场比MTJBS二极管高50.0%;在1 200 V反向偏压下,当器件表面峰值电场等于1 MV/cm时,JBS二极管肖特基接触面宽度为1.6 μm,MTJBS二极管肖特基接触面宽度为3.0 μm.采用相同器件参数制备JBS与MTJBS二极管并进行电学性能测试对比,MTJBS二极管的正向导通特性未显示出明显的退化,但击穿电压提高了约200 V,同时反向漏电降低了2个数量级.

A novel multi-step trench junction barrier Schottky(MTJBS)diode was proposed and its performance was studied via numerical simulation with Silvaco TCAD.The simulation results show that with the same structural parameters,the peak electric field at the Schottky contact of the conventional JBS is 50.0%higher than that of the MTJBS when the reverse bias(VR)is equal to 1 200 V.When the peak electric field at the surface of the device is equal to 1 MV/cm at VR is 1 200 V,the width of the Schottky contact of the JBS is 1.6 μm while that of the MTJBS is 3.0 μm.Based on the simulation results,the JBS and MTJBS are manufactured using the same structural parameters and subsequently tested.The forward conduction characteristic of the MTJBS does not show greatly degradation while the breakdown voltage is increased by about 200 V.At the same time,the reverse leakage current is reduced by about two orders of magnitude.

袁俊;陈伟;郭飞;成志杰;王宽;吴阳阳;辛国庆;王智强

华中科技大学电气与电子工程学院,湖北 武汉 430074||湖北九峰山实验室功率器件研发中心,湖北 武汉 430206湖北九峰山实验室功率器件研发中心,湖北 武汉 430206华中科技大学电气与电子工程学院,湖北 武汉 430074

电子信息工程

碳化硅结势垒肖特基二极管多级沟槽漏电流高温特性工艺流程

silicon carbidejunction barrier Schottky diodemulti-step trenchleakage currenthigh temperature characteristicsprocess flow

《华中科技大学学报(自然科学版)》 2024 (007)

87-91 / 5

2023年湖北省重大攻关项目(2023BAA009).

10.13245/j.hust.240739

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