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新型多级沟槽结势垒肖特基二极管

袁俊 陈伟 郭飞 成志杰 王宽 吴阳阳 辛国庆 王智强

华中科技大学学报(自然科学版)2024,Vol.52Issue(7):87-91,5.
华中科技大学学报(自然科学版)2024,Vol.52Issue(7):87-91,5.DOI:10.13245/j.hust.240739

新型多级沟槽结势垒肖特基二极管

New type multi-step trench junction barrier Schottky diode

袁俊 1陈伟 2郭飞 2成志杰 2王宽 2吴阳阳 2辛国庆 3王智强3

作者信息

  • 1. 华中科技大学电气与电子工程学院,湖北 武汉 430074||湖北九峰山实验室功率器件研发中心,湖北 武汉 430206
  • 2. 湖北九峰山实验室功率器件研发中心,湖北 武汉 430206
  • 3. 华中科技大学电气与电子工程学院,湖北 武汉 430074
  • 折叠

摘要

Abstract

A novel multi-step trench junction barrier Schottky(MTJBS)diode was proposed and its performance was studied via numerical simulation with Silvaco TCAD.The simulation results show that with the same structural parameters,the peak electric field at the Schottky contact of the conventional JBS is 50.0%higher than that of the MTJBS when the reverse bias(VR)is equal to 1 200 V.When the peak electric field at the surface of the device is equal to 1 MV/cm at VR is 1 200 V,the width of the Schottky contact of the JBS is 1.6 μm while that of the MTJBS is 3.0 μm.Based on the simulation results,the JBS and MTJBS are manufactured using the same structural parameters and subsequently tested.The forward conduction characteristic of the MTJBS does not show greatly degradation while the breakdown voltage is increased by about 200 V.At the same time,the reverse leakage current is reduced by about two orders of magnitude.

关键词

碳化硅/结势垒肖特基二极管/多级沟槽/漏电流/高温特性/工艺流程

Key words

silicon carbide/junction barrier Schottky diode/multi-step trench/leakage current/high temperature characteristics/process flow

分类

信息技术与安全科学

引用本文复制引用

袁俊,陈伟,郭飞,成志杰,王宽,吴阳阳,辛国庆,王智强..新型多级沟槽结势垒肖特基二极管[J].华中科技大学学报(自然科学版),2024,52(7):87-91,5.

基金项目

2023年湖北省重大攻关项目(2023BAA009). (2023BAA009)

华中科技大学学报(自然科学版)

OA北大核心CSTPCD

1671-4512

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