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首页|期刊导航|电子元件与材料|基于压电喷墨技术3D打印纳米银墨水的固化工艺研究

基于压电喷墨技术3D打印纳米银墨水的固化工艺研究OA北大核心CSTPCD

Curing process of 3D printing nano-silver ink based on piezoelectric inkjet technology

中文摘要英文摘要

为了改善喷墨3D打印纳米银墨水的导电性,研究热台固化、近红外固化和光热耦合固化对纳米银墨水固化后微观形貌和电导率的影响.通过压电喷墨打印纳米银墨水,并用热台和近红外灯对纳米银薄膜进行固化.结果表明:热台固化时,纳米银薄膜的电阻率随固化时间和固化温度的升高而降低,在固化时间25 min,固化温度140℃时下降至99 µΩ·cm;近红外固化时,固化功率1000 W,固化时间4 min的条件下,电阻率为33.2µΩ·cm;光热耦合固化时,纳米银薄膜的电阻率随扫描功率和固化时间的增加而降低,基板加热温度160 ℃、扫描功率为1000 W、固化时间60s的条件下,电阻率为3.75 µΩ·cm.光热耦合固化烧结颈的生长速度明显优于热固化及光固化.

In order to enhance the electrical performance of 3D inkjet-printed nano-silver ink,the effects of hot platform curing,near-infrared(NIR)curing,and photothermal coupling curing on the microstructure and conductivity of 3D inkjet-printed nano-silver ink were investigated.The results indicated that the resistivity of nano-silver films decreased with increasing curing time and temperature,99 µΩ·cm was achieved at the curing time of 25 min and curing temperature of 140℃.NIR curing at the power of 1000 W for 4 min reduced the resistivity to 33.2 μΩ·cm.Notably,during photothermal coupling curing,the electrical resistivity of the nanosilver film decreases with increasing scanning power and curing time.Under the conditions of substrate heating temperature of 160 ℃,scanning power of 1000 W and curing duration of 60 s,the lowest resistivity was 3.75 μΩ·cm.Additionally,the growth rate of the sintering necks during photothermal coupling curing was significantly faster than that of the thermal and photonic curing methods.

李超;林枝城;张义超;吕景祥

中国电子科技集团公司第二十研究所,陕西西安 710068||西安瑞特三维科技有限公司,陕西西安 710068长安大学工程机械学院,陕西西安 710064

电子信息工程

喷墨打印增材制造固化工艺纳米银

ink jet printingadditive manufacturingcuring processnano-silver

《电子元件与材料》 2024 (007)

853-859 / 7

国家重点研发计划项目(2022YFB4602800)

10.14106/j.cnki.1001-2028.2024.0071

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