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PI基材磁控溅射法制备柔性覆铜板的结合力优化研究

王恩泽 王顺花 尚伦霖 张广安

宇航材料工艺2024,Vol.54Issue(4):81-86,6.
宇航材料工艺2024,Vol.54Issue(4):81-86,6.DOI:10.12044/j.issn.1007-2330.2024.04.012

PI基材磁控溅射法制备柔性覆铜板的结合力优化研究

Research on the Optimization of Adhesion of Flexible Copper Clad Laminates Prepared by Magnetron Sputtering Method on PI Substrate

王恩泽 1王顺花 1尚伦霖 2张广安2

作者信息

  • 1. 兰州交通大学材料科学与工程学院,兰州 730070
  • 2. 中国科学院兰州化学物理研究所固体润滑国家重点实验室,兰州 730000
  • 折叠

摘要

Abstract

The deposition of copper layers on polyimide films by magnetron sputtering is widely used in the preparation of flexible copper-clad laminates.At present,low bonding strength between the surface copper film and the polyimide substrate is one of the main problems faced by the magnetron sputtering method in the preparation of flexible copper-clad laminates.This paper proposes to improve the adhesion of copper film on the surface by plasma etching treatment of polyimide substrate and introducing a metal Cr bonding layer.It also compares and studies the effects of different plasma etching and metal Cr layers on the microstructure,density,resistivity,and adhesion of the surface copper film.The results show that plasma etching increases the surface roughness and surface energy of polyimide,which is beneficial for copper film deposition and forms mechanical interlocking and chemical bonds at the interface to improve adhesion.The Cr metal intermediate layer can form a solid solution at the film interface to strengthen the adhesion,reaching the optimal 5B level.This study is of great significance in solving the problem of poor adhesion between copper film and polyimide substrate in the preparation of flexible copper-clad laminates by magnetron sputtering.

关键词

聚酰亚胺/铜膜/结合力/FCCL

Key words

Polyimide/Copper film/Adhesion/FCCL

分类

数理科学

引用本文复制引用

王恩泽,王顺花,尚伦霖,张广安..PI基材磁控溅射法制备柔性覆铜板的结合力优化研究[J].宇航材料工艺,2024,54(4):81-86,6.

基金项目

中国科学院科技服务网络计划(No.20201600200092) (No.20201600200092)

宇航材料工艺

OA北大核心CSTPCD

1007-2330

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