| 注册
首页|期刊导航|Journal of Semiconductors|Use of the epitaxial MTBs as a 1D gate(Lg=0.4 nm)for the construction of scaling down two-dimensional field-effect transistors

Use of the epitaxial MTBs as a 1D gate(Lg=0.4 nm)for the construction of scaling down two-dimensional field-effect transistors

Youla Yang Daixuan Wu He Tian Tian-Ling Ren

Journal of Semiconductors2024,Vol.45Issue(10):P.1-2,2.
Journal of Semiconductors2024,Vol.45Issue(10):P.1-2,2.DOI:10.1088/1674-4926/24070013

Use of the epitaxial MTBs as a 1D gate(Lg=0.4 nm)for the construction of scaling down two-dimensional field-effect transistors

Youla Yang 1Daixuan Wu 2He Tian 1Tian-Ling Ren1

作者信息

  • 1. School of Integrated Circuit,Tsinghua University,Beijing 100083,China
  • 2. School of Integrated Circuit,Tsinghua University,Beijing 100083,China School of Instrument Science and Technology,Xi''an Jiaotong University,Xi''an 710049,China
  • 折叠

摘要

关键词

silver/epitaxial/dimensional

分类

信息技术与安全科学

引用本文复制引用

Youla Yang,Daixuan Wu,He Tian,Tian-Ling Ren..Use of the epitaxial MTBs as a 1D gate(Lg=0.4 nm)for the construction of scaling down two-dimensional field-effect transistors[J].Journal of Semiconductors,2024,45(10):P.1-2,2.

Journal of Semiconductors

OACSTPCDEI

1674-4926

访问量0
|
下载量0
段落导航相关论文