射频磁控溅射生长ZnO薄膜及性能研究OA北大核心CSCDCSTPCD
Properties of ZnO Thin Film Grown by RF Magnetron Sputtering
采用射频磁控溅射技术在玻璃衬底生长ZnO及ZnO∶ Al薄膜,通过改变氩氧比、衬底温度和溅射功率获得样品.用X射线衍射仪、紫外-可见分光光度计、扫描电子显微镜进行表征.结果发现:室温下40W的溅射功率1h的溅射时间,改变氩氧比获得样品.XRD图谱中无明显衍射峰出现；紫外可见光分光光度计测试结果显示400nm波长以下,透光率在90％以上.说明薄膜生长呈无定形.衬底温度高于200℃样品,XRD有明显(002)衍射峰出现,在400～ 800 nm波长范…查看全部>>
Using the radio frequency reactive magnetron sputtering technique, ZnO and Al-dopped ZnO thin films were fabricated on glass substrate by changing the Ar/O2 ratio and substrate temperature. The film crystallinity, optical properties and surface morphology were investigated by X-ray diffraction, UV-visible spectrophotometer and scanning electron microscopy (SEM). The XRD results show that by changing the argon oxygen ratio, Al-dopped ZnO films deposited at sp…查看全部>>
朱华;刘辉文;况慧芸;冯晓炜
景德镇陶瓷学院机电学院,景德镇 333001景德镇陶瓷学院科技艺术学院,景德镇 333001景德镇陶瓷学院机电学院,景德镇 333001景德镇陶瓷学院科技艺术学院,景德镇 333001
数理科学
ZnO薄膜透过率磁控溅射
ZnO thin filmtransmittancemagnetron sputtering
《人工晶体学报》 2012 (1)
130-135,6
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