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期刊信息/Journal information
Industrial Chemistry & Materials

中国科学院过程工程研究所

双月刊

2755-2608

icm@ipe.ac.cn;icm@rsc.org

100190

北京市海淀区中关村北二街1号

Industrial Chemistry & Materials/Journal 工业化学与材料(英文)
《工业化学与材料(英文)》(Industrial Chemistry & Materials)(季刊),创刊于2023年,由中国科学院主管,中国科学院过程工程研究所主办,中科院深圳先进电子材料国际创新...展开全部>>
正式出版
收录年代
    2025年05期Issue 05,2025

    Introduction to advanced electronic chemicals

    Ruixia Liu;Rong Sun;Guoqiang Yang;P.507-508

    Engineering sulfonated polymers for the removal of ultra-trace complexed Cr(Ⅲ)in tris(2-carboxyethyl)isocyanurate photoresist resin monomers

    Huiyao Huang;Shiquan Zhong;Yawen Chen;Wangquan Gong;Changshen Ye;Ting Qiu;Jie Chen;P.618-630

    Synergistic strengthening of ion-exchange resins by post-crosslinking and selective sulfonation for PGMEA purification

    Nian Zhang;Fan Liu;Dan Li;Chunyan Shi;Aizi Cai;Shizhe Xu;Yaocheng Dai;Yan Wang;Haifeng Dong;P.631-642

    On-line detection of additive concentrations in acidic copper plating solution for metal interconnection by an electrochemical microfluidic workstation

    Yi Zhao;Ju-Xing Zeng;Jia-Qiang Yang;Tao Song;Ren Hu;Jian-Jia Su;Bo Zhang;Fang-Zu Yang;Dongping Zhan;Lianhuan Han;P.607-617

    Molecular topology-driven benzocyclobutenebased ultralow dielectrics with copper-matched low thermal expansion

    Menglu Li;Linfeng Fan;Quan Sun;Meng Xie;Jin Guo;Wenxin Fu;P.596-606

    Synthesis and properties of a novel perfluorinated polyimide with high toughness,low dielectric constant and low dissipation factor

    Hangqian Wang;Yao Zhang;Xialei Lv;Jinhui Li;Kuangyu Wang;Guoping Zhang;Rong Sun;P.587-595

    Silane production from the dichlorosilane byproduct of the Siemens process:a comparative study with the trichlorosilane route

    Zi-Yi Chi;Peng-Bo Bai;Wen-De Xiao;Ming-Dong Zhou;Xue-Gang Li;P.578-586

    Fine-tuned ultramicroporous carbon materials via CO_(2)activation for molecular sieving of fluorinated propylene and propane

    Yiwen Fu;Liangzheng Sheng;Wei Xia;Guangtong Hai;Jialei Yan;Lihang Chen;Qiwei Yang;Zhiguo Zhang;Qilong Ren;Zongbi Bao;P.567-577

    Lithographic performances of aryl sulfonate estermodified polystyrenes as nonchemically amplified resists

    Rongrong Peng;Peng Lian;Jinping Chen;Tianjun Yu;Yi Zeng;Shuangqing Wang;Xudong Guo;Rui Hu;Jun Zhao;Yanqing Wu;Guoqiang Yang;Yi Li;P.553-566

    Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance via intramolecular interactions

    Hao Chen;Wenzheng Li;Yingdong Zhao;Xinyan Huang;Jialong Zhang;Peijun Ji;Jun Zhao;Pengzhong Chen;Xiaojun Peng;P.543-552